Chemical Engineering · Chemistry · Physics and Astronomy
| ISSN | 09481907, 15213862 |
|---|---|
| Country | United Kingdom |
| Publisher | John Wiley & Sons Ltd. |
| Subject Areas | Chemical Engineering · Chemistry · Physics and Astronomy |
| Publication Type | Journals |
| Active Years | 1995-2015 |
| Competitiveness | 1. (0-20) Least Competitive |
| Publication Time | 3. Fair (3-6 months) |
| Website | Visit journal |
Chemical Vapor Deposition (CVD) publishes Reviews, Short Communications, and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information, and book reviews. All papers are peer-reviewed. The journal provides a unified forum for chemists, physicists, and engineers whose publications on chemical vapor deposition have in the past been spread over journals covering inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films, and ceramic processing.
| Year | 2-Year IF | 3-Year IF | 4-Year IF |
|---|---|---|---|
| 2018 | — | 1.933 | 1.890 |
| 2017 | 2.111 | 2.231 | 2.444 |
| 2016 | 1.484 | 1.917 | 1.746 |
| 2015 | 2.011 | 1.956 | 1.793 |
| 2014 | 1.856 | — | — |
| 2013 | 1.370 | — | — |
| 2012 | 1.475 | — | — |
| 2011 | 1.729 | — | — |
| 2010 | 1.989 | — | — |
| 2009 | 1.970 | — | — |
| 2008 | 1.484 | — | — |
| 2007 | 1.958 | — | — |
| 2006 | 1.838 | — | — |
| 2005 | 2.480 | — | — |
| 2004 | 2.297 | — | — |
| 2003 | 2.452 | — | — |
| 2002 | 1.810 | — | — |
| 2001 | 2.205 | — | — |
| 2000 | 1.824 | — | — |
Note: impact factor data for reference only.
SJR measures scientific influence, weighting citations by the prestige of the citing journal.
| Year | SJR Score |
|---|---|
| 2018 | 0.533 |
| 2017 | 0.639 |
| 2016 | 0.654 |
| 2015 | 0.612 |
The H-Index measures both the productivity and citation impact of a journal's publications.
| Year | H-Index |
|---|---|
| 2021 | 64.000 |
| 2020 | 62.000 |