Plasma Chemistry and Plasma Processing

Chemical Engineering · Chemistry · Materials Science

Impact Factor
2.811
2023
H-Index
81.000
2023
SJR
0.480
2023

I. Journal Information

ISSN02724324, 15728986
CountryUnited States
PublisherKluwer Academic/Plenum Publishers
Subject AreasChemical Engineering · Chemistry · Materials Science
Publication TypeJournals
Active Years1981-ongoing
Competitiveness4. (61-80) Competitive
Publication Time2. Quick (1-3 months)
WebsiteVisit journal
JIF 2022–20232.600
2019-2020 SCR Rank5268
2020-2021 SCR Rank4582

II. Scope & Description

Plasma Chemistry and Plasma Processing is an international journal that provides a forum for the publication of original papers on fundamental research and new developments in plasma chemistry and plasma processing. The journal encompasses all types of industrial processing plasmas, ranging from nonthermal plasmas to thermal plasmas, and publishes fundamental plasma studies as well as studies of specific plasma applications. Application contexts of interest include plasma etching in microelectronics and other fields, deposition of thin films and coatings, powder synthesis, environmental processing, lighting, surface modification and others. Papers are particularly encouraged that report studies of chemical kinetics in plasmas, or the interactions of plasmas with surfaces.

III. Impact Factor History

Year2-Year IF3-Year IF4-Year IF
20232.8113.0933.274
20223.7683.7003.545
20213.5563.4253.209
20202.9242.7103.058
20192.3452.9082.873
20182.9692.8773.026
20173.0563.0402.899
20162.6052.5062.511
20152.0902.2222.159
20142.296
20131.851
20122.072
20111.864
20101.636
20091.902
20082.323
20072.083
20060.973
20052.072
20041.986
20031.186
20021.242
20011.650
20001.368

Note: impact factor data for reference only.

IV. SCImago Journal Rank (SJR)

SJR measures scientific influence, weighting citations by the prestige of the citing journal.

YearSJR Score
20230.480
20220.577
20210.549
20200.513
20190.590
20180.656
20170.719
20160.665
20150.570

V. H-Index

The H-Index measures both the productivity and citation impact of a journal's publications.

YearH-Index
202381.000
202272.000
202168.000
202065.000

How to Get Published

https://mc.manuscriptcentral.com/pcpp